Growth of a W/TiN-bilayer coating: an alternative to diffusion barrier keeping the hard coating condition of the system: Original scientific paper. J. Electrochem. Sci. Eng. [Internet]. 2026 Jan. 2 [cited 2026 Jun. 16];16. Available from: https://pub.iapchem.org/ojs/index.php/JESE/article/view/2983