Growth of a W/TiN-bilayer coating: an alternative to diffusion barrier keeping the hard coating condition of the system: Original scientific paper. Journal of Electrochemical Science and Engineering, [S. l.], v. 16, 2026. DOI: 10.5599/jese.2983. Disponível em: https://pub.iapchem.org/ojs/index.php/JESE/article/view/2983. Acesso em: 16 jun. 2026.